- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/78 - Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam
Patent holdings for IPC class G03F 1/78
Total number of patents in this class: 139
10-year publication summary
|
17
|
15
|
18
|
23
|
13
|
13
|
10
|
8
|
16
|
1
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
31 |
| D2s, Inc. | 150 |
23 |
| NuFlare Technology, Inc. | 770 |
13 |
| Samsung Electronics Co., Ltd. | 131630 |
8 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
6 |
| Hoya Corporation | 2822 |
5 |
| FUJIFILM Corporation | 27102 |
4 |
| Applied Materials, Inc. | 16587 |
3 |
| SK Hynix Inc. | 11030 |
3 |
| Lam Research Corporation | 4775 |
3 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8635 |
3 |
| Nippon Control System Corporation | 18 |
3 |
| Kioxia Corporation | 9847 |
3 |
| International Business Machines Corporation | 60644 |
2 |
| Intel Corporation | 45621 |
2 |
| Texas Instruments Incorporated | 19376 |
2 |
| Carl Zeiss SMT GmbH | 2646 |
2 |
| GenISys GmbH | 5 |
2 |
| The University of Manchester | 456 |
2 |
| Agc, Inc. | 4029 |
2 |
| Other owners | 17 |